1.

Conference Proceedings
Conference Proceedings
1. Plasma etch of binary Cr masks:CD uniformity study of photomasks utilizing varying Cr loads
Constantine,C. ; Westerman,R.J. ; Plumhoff,J.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.93-97,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Investigation of quartz etch rate uniformity for alternating phase-shift mask applications utillzing a next-generation ICP source
Strawn,C. ; Constantine,C. ; Plumhoff,J. ; Westerman,R.J.
Pub. info.: 17th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.23-31,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4349
3.

Conference Proceedings
Conference Proceedings
3. Investigation of MoSi etch processes for embedded attenuating phase shift mask applications utilizing a next-generation ICP source
Plumhoff,J. ; Constantine,C. ; Strawn,C. ; Shin,J.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.694-703,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
4.

Conference Proceedings
Conference Proceedings
4. Plasma etch of binary Cr masks: CD uniformity study of photomasks utilizing varying Cr loads: ？
Constantine,C. ; Westerman,R.J. ; Plumhoff,J.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.85-96,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
5.

Conference Proceedings
Conference Proceedings
5. Plasma etching of quartz for the fabrication of alternating aperture phase-shift photomasks: etch rate uniformity study utilizing a next-generation ICP source
Westerman,R.J. ; Constantine,C. ; Plumhoff,J. ; Strawn,C.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.316-324,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186