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12 results

Conference Proceedings

1. IR spectroscopic ellipsometry for industrial characterization of semiconductors

Boher,P. ; Bucchia,M. ; Piel,J.P. ; Defranoux,C. ; Stehle,J.L. ; Pickering,C.

Pub. info.:	Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA. pp.69-78, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4449

Conference Proceedings

2. Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool

Boher,P. ; Piel,J.P. ; Stehle,J.L. ; Pickering,C. ; Tarnowka,A.

Pub. info.:	Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA. pp.79-89, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4449

Conference Proceedings

3. Combined metrology including VUV spectroscopic ellipsometer and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm

Boher,P. ; Evrard,P. ; Piel,J.P. ; Stehle,J.L.

Pub. info.:	Optical metrology roadmap for the semiconductor, optical, and data storage industries II : 2-3 August 2001 San Diego, USA. pp.30-40, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4449

Conference Proceedings

4. Phase-shifting interference microscope for the characterization of metallic interconnections of flat panel displays

Boher,P. ; Piel,J.P. ; Stehle,J.L. ; Dubois,A. ; Boccara,A.C.

Pub. info.:	Surface scattering and diffraction for advanced metrology : 1 August 2001 San Diego, USA. pp.42-52, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4447

Conference Proceedings

5. New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry

Boher,P. ; Defranoux,C. ; Piel,J.P. ; Stehle,J.L.P.

Pub. info.:	Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.92-103, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3741

Conference Proceedings

6. New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm

Boher,P. ; Piel,J.P. ; Evrard,P. ; Defranoux,C. ; Espinosa,M. ; Stehle,J.L.P.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.379-389, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

7. New process for manufacturing thin SiGe and SiGeC epitaxial films on silicon by ion implantation and excimer laser annealing

Boher,P. ; Stehle,J.L.P. ; Piel,J.P. ; Fogarassy,E.

Pub. info.:	Microelectronic device technology II : 23-24 September, 1998, Santa Clara, California. pp.201-209, 1998. Bellingham, Washington. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3506

Conference Proceedings

8. Fine characterization of ITO layers by spectroscopic ellipsometry

Boher,P. ; Defranoux,C. ; Piel,J.P. ; Stehle,J.L. ; Suzuki,Y.

Pub. info.:	International Symposium on Polarization Analysis and Applications to Device Technology. pp.297-300, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2873

Conference Proceedings

9. Precise measurement of ARC optical indices in the deep-UV range by variable-angle spectroscopic ellipsometry

Boher,P. ; Stehle,J.L. ; Piel,J.P. ; Defranoux,C. ; Hennet,L.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XI. pp.205-214, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3050

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Conference Proceedings

10. Characterization of resists and antireflective coatings by spectroscopic ellipsometry in the UV and deep-UV range

Boher,P. ; Piel,J.P. ; Defranoux,C. ; Stehle,J.-L. ; Hennet,L.

Pub. info.:	Optical Microlithography IX. Part2 pp.608-620, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726

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Author: Piel,J.P.