1.

Conference Proceedings
Conference Proceedings
1. New instrument to characterize materials and optics for 157-nm lithography
Boher,P. ; Evrard,P. ; Piel,J.-P. ; Stehle,J.-L.P.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.133-143,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
2.

Conference Proceedings
Conference Proceedings
2. New purged UV spectroscopic ellipsometer to characterize thin films and multilayers at 157 nm
Boher,P. ; Evrard,P. ; Piel,J.-P. ; Stehle,J.-L.P.
Pub. info.: Optical metrology roadmap for the semiconductor, optical, and data storage industries , 30-31 July 2000, San Diego, USA.  pp.206-217,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4099
3.

Conference Proceedings
Conference Proceedings
3. Characterization of ultrathin gate dielectrics using combined grazing x-ray reflectance and spectroscopic ellipsometry
Boher,P. ; Piel,J.-P. ; Evard,P. ; Defranoux,C. ; Stehle,J.-L.P.
Pub. info.: Process and equipment control in microelectronic manufacturing II : 30-31 May, 2001, Edinburgh, UK.  pp.44-55,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4405
4.

Conference Proceedings
Conference Proceedings
4. Combined metrology in cluding VUV spectroscopic ellipsometry and grazing x-ray reflectance for precise characterization of thin films and multilayers at 157 nm
Boher,P. ; Evrard,P. ; Piel,J.-P. ; Janicot,S. ; Stehle,J.-L.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.654-664,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
5.

Conference Proceedings
Conference Proceedings
5. Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool
Boher,P. ; Pickering,C. ; Tarnowka,A. ; Piel,J.-P. ; Evrard,P. ; Stehle,J.-L.P.
Pub. info.: Process Control and Diagnostics.  pp.115-123,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4182