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11 results

Conference Proceedings

1. Defect printability for sub-0.18ｦﾌm design rules using 193-nm lithography process and binary OPC reticle

Phan,K.A. ; Spence,C.A. ; Schefske,J.A. ; Okoroanyanwu,U. ; Levinson,H.J.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.773-780, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

2. Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system

Phan,K.A. ; Spence,C.A. ; Dakshina-Murthy,S. ; Bala,V. ; Williams,A.M. ; Strener,S. ; Eandi,R.D. ; Li,J. ; Karklin,L.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.681-694, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

3. Methodology for the optimization of an i-line lithographic process for defect reduction

Phan,K.A. ; Bains,G. ; Steele,D.A. ; Orth,J.A. ; Subramanian,R.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.309-320, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

4. Single closed contact for 0.18-ｦﾌm photolithography process

Cheung,C. ; Phan,K.A. ; Chiu,R.

Pub. info.:	Metrology, inspection, and process control for microlithography XIV : 28 February - 2 March 2000, San Clara, California. pp.738-748, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3998

Conference Proceedings

5. Manufacturability of the ultrathin resist process

Pike,C. ; Bell,S. ; Plat,M.V. ; King,P. ; Nguyen,K.B. ; Lyons,C.F. ; Levinson,H.J. ; Phan,K.A. ; Okoroanyanwu,U.

Pub. info.:	Emerging lithographic technologies IV : 28 February-1 March 2000, Santa Clara, USA. pp.328-333, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3997

Conference Proceedings

6. Efficient and cost-effective photo defect monitoring

Phan,K.A. ; Chiu,R. ; Punjabi,S ; Singh,B.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.709-720, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

7. Enhanced dispositioning of reticle defects using the Virtual Stepper with automated defect severity scoring

Cai,L. ; Phan,K.A. ; Spence,C.A. ; Pang,L. ; Chan,K.K.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VIII. pp.467-478, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4409

Conference Proceedings

8. Correlation of reticle defects detectability and repairs to ArF wafer printability for 0.13-μm design rule with binary OPC/SB mask

Phan,K.A. ; Spence,C.A. ; Riddick,J. ; Chen,J.X. ; Lamantia,M. ; Villa,H.A.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.183-197, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

Conference Proceedings

9. Automatic defect severity scoring for 193-nm reticle defect inspection

Karklin,L. ; Altamirano,M.M. ; Cai,L. ; Phan,K.A. ; Spence,C.A.

Pub. info.:	Optical Microlithography XIV. 4346 pp.898-906, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

10.

Conference Proceedings

10. Novel approach for defect detection and reduction techniques for submicron lithography

Orth,J.A. ; Phan,K.A. ; Steele,D.A. ; Young,R.Y.B.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XI. pp.586-601, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3050

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