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10 results

Conference Proceedings

1. Complementary dipole exposure solutions at 0.29 k1

Heumann, J. ; Schramm, J. ; Birnstein, A. ; Park, K. T. ; Witte, T. ; Morgana, N. ; Hennig, M. ; Pforr, R. ; Thiele, J. ; Schmidt, N. ; Aquino, C.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.327-338, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

2. Contact layer printing using alternating phase-shifting masks: mask making, patterning results, and production implementation

Pforr, R. ; Dettmann, W. ; Eisenhut, M. ; Hennig, M. ; Hofmann, D. ; Thiele, J. ; Thielscher, G.

Pub. info.:	20th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.178-187, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5504

Conference Proceedings

3. Alternating PSM balancing characterization: a comparative study using AIMS and wafer print data [6154-163]

Sczyrba, M. ; Kahle, R. ; Bubke, K. ; Pforr, R. ; Neubauer, R.

Pub. info.:	Optical Microlithography XIX. pp.615448-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

Conference Proceedings

4. Simulation of quartz phase etch affect on performance of ArF chrome-less hard shifter for 65-nm technology [5853-57]

Park, K. T. ; Sczyrba, M. ; Bubke, K. ; Pforr, R.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.722-730, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

5. Full-level alternating PSM for sub-100nm DRAM gate patterning

Pforr, R. ; Ahrens, M. ; Dettmann, W. ; Hennig, M. ; Koehle, R. ; Ludwig, B. ; Morgana, N. ; Thiele, J.

Pub. info.:	Optical Microlithography XVI. Part One pp.232-243, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

6. Introduction of full-level alternating phase-shift mask technology into IC manufacturing

Thiele, J. ; Ahrens, M. ; Dettmann, W. ; Heissmeier, M. ; Hennig, M. ; Ludwig, B. ; Moukara, M. ; Pforr, R.

Pub. info.:	Optical Microlithography XV. Part One pp.89-97, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

7. Image degradation due to phase effects in chromeless phase lithography [6349-38]

Bubke, K. ; Sczyrba, M. ; Park, K. T. ; Neubauer, R. ; Pforr, R. ; Reichelt, J. ; Ziebold, R.

Pub. info.:	Photomask Technology 2006. pp.634913-634914, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

8. Hard phase-shifting masks for the 65-nm node: a performance comparison

Pforr, R. ; Hennig, M. ; Koehle, R. ; Morgana, N. ; Thiele, J. ; Weckesser, J.

Pub. info.:	Optical Microlithography XVII. pp.212-221, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

Conference Proceedings

9. Irradiation resistance of intravolume shading elements embedded in photomasks used for CD uniformity control by local intra-field transmission attenuation [6283-11]

Zait, E. ; Ben-Zvi, G. ; Dmitriev, V. ; Oshemkov, S. ; UCLT Ltd. (Israel) ; Pforr, R. ; Henning, M.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62830E-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

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Conference Proceedings

10. Aerial image based mask defect detection in dense array structures [5853-85]

Kohle, R. ; Hennig, M. ; Pforr, R. ; Bubke, K. ; Sczyrba, M. ; Durr, A. C.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.953-964, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

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Author: Pforr, R.