1.

Conference Proceedings
Conference Proceedings
1. Precision cryogenic dilatometer for James Webb space telescope materials testing
Dudik, M.J. ; Halverson, P.G. ; Levine, M.B. ; Marcin, M. ; Peters, R.D. ; Shaklan, S.
Pub. info.: Optical materials and structures technologies :4-7 August 2003, San Diego, California.  pp.155-164,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5179
2.

Conference Proceedings
Conference Proceedings
2. CPL reticle technology for advanced device applications
Conley, W.E. ; Van Den Broeke, D.J. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K.D. ; Roman, B.J. ; Peters, R.D. ; Parker, C. ; Chen, J.F. ; Wampler, K.E. ; Laidig, T.L. ; Schaefer, E. ; Kuijten, J.-P. ; Verhappen, A. ; van de Goor, S. ; Chaplin, M. ; Kasprowicz, B.S. ; Progler, C.J. ; Robert, E. ; Thony, P. ; Hathorn, M.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.578-584,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
3.

Conference Proceedings
Conference Proceedings
3. Line-edge roughness reduction and CD slimming using hardback processing
Peters, R.D. ; Lucas, K. ; Cobb, J.L. ; Parker, C. ; Patterson, K. ; McCauley, R. ; Ercken, M. ; Roey, F.V. ; Vandenbroeck, N. ; Pollentier, I.K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.1131-1142,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
4.

Conference Proceedings
Conference Proceedings
4. Integration of UTR processes into MPU IC manufacturing flows
Cobb, J.L. ; Dakshina-Murthy, S. ; Parker, C. ; Luckowski, E. ; Martinez, A.M. ; Peters, R.D. ; Wu, W. ; Hector, S.D.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.277-286,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
5.

Conference Proceedings
Conference Proceedings
5. Design considerations and validation of the MSTAR absolute metrology system
Peters, R.D. ; Lay, O.P. ; Dubovitsky, S. ; Burger, J. ; Jeganathan, M.
Pub. info.: Interferometry XII: Techniques and Analysis.  pp.32-43,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5531
6.

Conference Proceedings
Conference Proceedings
6. Single-layer and bilayer resist processes for EUV-type integrations
Peters, R.D. ; Parker, C. ; Cobb, J. ; Luckowski, E. ; Weisbrod, E. ; Dauksher, B.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.746-756,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
7.

Conference Proceedings
Conference Proceedings
7. The application of CPL reticle technology for the 0.045-mm node
Conley, W. ; Van Den Broeke, D.J. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K.D. ; Roman, B.J. ; Peters, R.D. ; Parker, C. ; Chen, F. ; Wampler, K.E. ; Laidig, T.L. ; Schaefer, E. ; Kuijten, J.-P. ; Verhappen, A. ; van de Goor, S. ; Chaplin, M. ; Kasprowicz, B.S. ; Progler, C.J. ; Robert, E. ; Thony, P.
Pub. info.: Optical Microlithography XVII.  pp.504-509,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
8.

Conference Proceedings
Conference Proceedings
8. Fabrication of integrated circuits with high yield using ultra-thin resist processes
Peters, R.D. ; Postnikov, S.V. ; Cobb, J.L. ; Dakshina-Murthy, S. ; Stephens, T. ; Parker, C. ; Luckowski, E. ; Martinez, A.M. Jr., ; Wu, W. ; Hector, S.D.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1390-1401,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
9.

Conference Proceedings
Conference Proceedings
9. Controlling line-edge rougness to within reasonable limits
Cobb, J.L. ; Rauf, S. ; Thean, A. ; Dakshina-Murthy, S. ; Stephens, T. ; Parker, C. ; Peters, R.D. ; Rao, V.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.376-383,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
10.

Conference Proceedings
Conference Proceedings
10. Ultrathin photoresists for 193-nm lithography
Peters, R.D. ; Amblard, G.R. ; Lee, J.-J. ; Guenther, T.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.393-403,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039