1.

Conference Proceedings
Conference Proceedings
1. Compaction and rarefaction of fused silica with 193-nm excimer laser exposure
Algots, J.M. ; Sandstrom, R. ; Partlo, W.N. ; Maroevic, P. ; Eva, E. ; Gerhard, M. ; Linder, R. ; Stietz, F.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1639-1650,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Optimization of a dense plasma focus device as a light source for EUV lithography
Fomenkov, I.V. ; Partlo, W.N. ; Ness, R.M. ; Oliver, I.R. ; Melnychuk, S.T. ; Khodykin, O.V. ; Boewering, N.R.
Pub. info.: Emerging Lithographic Technologies VI.  Part Two  pp.634-647,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688