1.

Conference Proceedings
Conference Proceedings
1. Effect of SC-1 Process Parameters on Particle Removal and Surface Metallic Contamination
Hall, R. Mark ; Rosato, John J. ; Jarvis, Taura ; Parry, Thad ; Lindquist, Paul G.
Pub. info.: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.127-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 386
2.

Conference Proceedings
Conference Proceedings
2. Practical Considerations in Megasonic Wafer Cleaning
Hall, R. Mark ; Jarvis, Taura ; Parry, Thad
Pub. info.: Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A..  pp.15-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 477