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Conference Proceedings

1. LOW TEMPERATURE SILICON OXIDATION WITH ELECTRON CYCLOTRON RESONANCE OXYGEN PLASMA

Sung, K. T. ; Pang, S. W.

Pub. info.:	Photons and low energy particles in surface processing : symposium held Decmber[i.e. December] 3-6, 1991, Boston, Massachusetts, U.S.A.. pp.319-324, 1992. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	236

Conference Proceedings

2. *A COMPARISON BETWEEN DRY ETCHING WITH AN ELECTRON CYCLOTRON RESONANCE SOURCE AND REACTIVE ION ETCHING FOR GaAs AND InP

Pang, S. W.

Pub. info.:	Advanced III-V compound semiconductor growth, processing and devices : symposium held Decmber[i.e. December] 2-5, 1991, Boston, Massachusetts, U.S.A.. pp.273-284, 1992. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	240

Conference Proceedings

3. EVALUATION OF DRY ETCHING INDUCED DAMAGE OF GaInAs USING TRANSMISSION LINES AND SCHOTTKY DIODES

Thomas, S., III ; Pang, S. W.

Pub. info.:	Diagnostic techniques for semiconductor materials processing : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.. pp.421-, 1994. Pittsburgh. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	324

Conference Proceedings

4. PHOTOREFLECTANCE CHARACTERIZATION OF ETCH-INDUCED DAMAGE IN DRY ETCHED GaAs

Glembocki, O. J. ; Tuchman, J. A. ; Ko, K. K. ; Pang, S. W. ; Giordana, A. ; Stutz, C. E.

Pub. info.:	Diagnostic techniques for semiconductor materials processing : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.. pp.153-, 1994. Pittsburgh. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	324

Conference Proceedings

5. In-Situ Fiberoptic Thermometry Measurements of Wafer Temperature During Plasma Etching Using an Electron Cyclotron Resonance Source

Thomas, S., III ; Berg, E. W. ; Pang, S. W.

Pub. info.:	Diagnostic techniques for semiconductor materials processing II : symposium held November 27-30, 1995, Boston, Massachusetts, U.S.A.. pp.75-, 1996. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	406

Conference Proceedings

6. RELATING PHOTORESIST ETCH CHARACTERISTICS TO LANGMUIR PROBE MEASUREMENTS IN AN ELECTRON CYCLOTRON RESONANCE SOURCE

Sung, K. T. ; Juan, W. H. ; Pang, S. W. ; Dahimene, M.

Pub. info.:	Diagnostic techniques for semiconductor materials processing : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.. pp.305-, 1994. Pittsburgh. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	324

Conference Proceedings

7. IN-SITU MONITORING BY MASS SPECTROMETRY FOR GaAs ETCHED WITH AN ELEFCTRON CYCLOTRON RESONANCE SOURCE

Kahaian, D. J. ; Pang, S. W.

Pub. info.:	Diagnostic techniques for semiconductor materials processing : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.. pp.329-, 1994. Pittsburgh. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	324

Conference Proceedings

8. Electrical Characterization and Surface Analysis of Dry Etch Induced Damage on Si after Etching in an Electron Cyclotron Resonance Source

Sung, K. T. ; Pang, S. W. ; Cole, M.W. ; Pearce, N.

Pub. info.:	Proceedings of the tenth symposium on plasma processing. pp.132-143, 1994. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1994-20

Conference Proceedings

9. LOW TEMPERATURE SILICON OXIDATION WITH ELECTRON CYCLOTRON RESONANCE OXYGEN PLASMA

Sung, K. T. ; Pang, S. W.

Pub. info.:	Phase formation and modification by beam-solid interactions : symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A.. pp.781-786, 1992. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	235

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Conference Proceedings

10. Response Time for Optical Emission and Mass Spectrometric Signals During Etching of Heterostructures

Thomas, S., III ; Chen, H. H. ; Pang, S. W.

Pub. info.:	Diagnostic techniques for semiconductor materials processing II : symposium held November 27-30, 1995, Boston, Massachusetts, U.S.A.. pp.27-, 1996. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	406

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Author: Pang, S. W.