1.

Conference Proceedings
Conference Proceedings
1. In-field CD uniformity control by altering transmission distribution of the photomask using ultra fast pulsed laser technology [6283-29]
Morikawa, Y. ; Sutou, T. ; Inazuki, Y. ; Adachi, T. ; Yoshida, Y. ; Kojima, K. ; Sasaki, S. ; Mohri, H. ; Hayashi, N. ; Dmitriev, V. ; Oshemkov, S. ; Zait, E. ; Ben-Zvi, G.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831Y-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
2.

Conference Proceedings
Conference Proceedings
2. Irradiation resistance of intravolume shading elements embedded in photomasks used for CD uniformity control by local intra-field transmission attenuation [6283-11]
Zait, E. ; Ben-Zvi, G. ; Dmitriev, V. ; Oshemkov, S. ; UCLT Ltd. (Israel) ; Pforr, R. ; Henning, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830E-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283