1.

Conference Proceedings
Conference Proceedings
1. Dissolution inhibitors for 157-nm microlithography
Conley, W. ; Miller, D.A. ; Chambers, C.R. ; Osborn, B.P. ; Hung, R.J. ; Tran, H.V. ; Trinque, B.C. ; Pinnow, M.J. ; Chiba, T. ; McDonald, S. ; Zimmerman, P. ; Dammel, R.R. ; Romano, A.R. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.69-75,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
2.

Conference Proceedings
Conference Proceedings
2. Advances in resists for 157-nm microlithography
Trinque, B.C. ; Osborn, B.P. ; Chambers, C.R. ; Hsieh, Y.-T. ; Corry, S.B. ; Chiba, T. ; Hung, R.J. ; Tran, H.V. ; Zimmerman, P. ; Miller, D. ; Conley, W. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.58-68,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
3.

Conference Proceedings
Conference Proceedings
3. Design of dissolution inhibitors for chemically amplified photolithographic systems
Chambers, C.R. ; Kusumoto, S. ; Osborn, B.P. ; Vasudev, A. ; Ootani, M. ; Walthal, L. ; McMichael, H. ; Zimmerman, P.A. ; Conley, W.E. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.360-368,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
4.

Conference Proceedings
Conference Proceedings
4. Advances in TFE-based fluoropolymers for 157-nm lithography: a progress report
Sharif, I. ; DesMarteau, D. ; Ford, L. ; Shafer, G.J. ; Thomas, B. ; Conley, W. ; Zimmerman, P. ; Miller, D. ; Lee, G.S. ; Chambers, C.R. ; Trinque, B.C. ; Chiba, T. ; Osborn, B.P. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.33-42,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
5.

Conference Proceedings
Conference Proceedings
5. Negative photoresist for 157-nm microlithography: a progress report
Conley, W. ; Trinque, B.C. ; Miller, D. ; Caporale, S. ; Osborn, B.P. ; Kumamoto, S. ; Pinnow, M.J. ; Callahan, R. ; Chambers, C.R. ; Lee, G.S. ; Zimmerman, P. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.622-626,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
6.

Conference Proceedings
Conference Proceedings
6. Dissolution inhibitors for 157-nm photolithography
Chambers, C.R. ; Kusumoto, S. ; Lee, G.S. ; Vasudev, A. ; Walthal, L. ; Osborn, B.P. ; Zimmerman, P. ; Conley, W.E. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.93-102,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039