1.

Conference Proceedings
Conference Proceedings
1. Full chip model based correction of flare-induced linewidth variation
James Word ; Jerome Belledent ; Yorick Trouiller ; Yuri Granik ; Olivier Toublan ; Wilhelm Maurer
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1209-1219,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. High accuracy 65nm OPC verification: full process window model vs. critical failure ORC
Amandine Borjon ; Jerome Belledent ; Shumay D. Shang ; Olivier Toublan ; Corinne Miramond ; Kyle Patterson ; Kevin Lucas ; Christophe Couderc ; Yves Rody ; Frank Sundermann ; Jean-Christophe Urbani ; Stanislas Baron ; Yorick Trouiller ; Patrick Schiavone
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1190-1201,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754