1.

Conference Proceedings
Conference Proceedings
1. New method for reducing across-chip poly-CD variation with statistical OPC/gauge capability analysis
Ohnuma, H. ; Kikuchi, K. ; Kawahira, H.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.352-360,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
2.

Conference Proceedings
Conference Proceedings
2. Impact of inter-mask CD error on OPC accuracy in resolution of 90 nm and below
Ozawa, K. ; Sato, S. ; Ohnuma, H.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.404-416,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
3.

Conference Proceedings
Conference Proceedings
3. The Dynamics of Surface-Catalyzed Reactions Studied by Infrared Chemiluminescence of the CO and CO2 Products
Watanabe, K. ; Uetsuka, H. ; Ohnuma, H. ; Kunimori, K.
Pub. info.: 11th International Congress on Catalysis, 40th anniversary : Proceedings of the 11th ICC, Baltimore, MD, USA, June 30-July 5, 1996.  Part A  pp.891-,  1996.  New York.  Elsevier
Title of ser.: Studies in surface science and catalysis
Ser. no.: 101
4.

Conference Proceedings
Conference Proceedings
4. Advanced mask pattern correction method of alternating PSM: improvement of line width uniformity in the shifter length direction
Yoshida, M. ; Ozawa, K. ; Ogawa, K. ; Ohnuma, H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.560-569,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
5.

Conference Proceedings
Conference Proceedings
5. Phase defect printability of alternating phase shift masks for ArF lithography
Ohba, N. ; Ishikawa, K. ; Katsumata, M. ; Ohnuma, H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.756-765,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
6.

Conference Proceedings
Conference Proceedings
6. The photomask technologies in hyper-NA lithography (Invited Paper) [5992-42]
Watanabe, H. ; Ohnuma, H.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.599215-599215,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
7.

Conference Proceedings
Conference Proceedings
7. Complementary splitting with stress emulation for stencil masks
Nakayama, K. ; Inoue, K. ; Ashida, I. ; Omori, S. ; Ohnuma, H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.979-989,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
8.

Conference Proceedings
Conference Proceedings
8. Impact of inter-mask CD error on OPC accuracy for resolutions of 90 nm and below
Ozawa, K. ; Sato, S. ; Ohnuma, H.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1006-1017,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
9.

Conference Proceedings
Conference Proceedings
9. Defect printability of alternating phase-shift mask: a critical comparison of simulation and experiment
Ozawa, K. ; Komizo, T. ; Kikuchi, K. ; Ohnuma, H. ; Kawahira, H.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1009-1020,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
10.

Conference Proceedings
Conference Proceedings
10. Defect printability of ArF alternative phase-shift mask: a critical comparison of simulation and experiment
Ozawa, K. ; Komizo, T. ; Ohnuma, H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.630-639,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754