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17 results

Conference Proceedings

1. ADVANCED WET CLEANING METHOD WITH ONE TENTH QUANTITY OF CLEANING SOLUTIONS

Mitsumori, Kenichi ; Haga, Nobuaki ; Kasama, Yasuhiko ; Takahashi, Norihisa ; Imaoka, Takashi ; Ohmi, Tadahiro

Pub. info.:	Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium. pp.37-44, 1999. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	99-36

Conference Proceedings

2. High Integrity Direct Oxidation/Nitridation At Low Temperature Using Radicals*

Ohmi, Tadahiro ; Sugawa, Shigetoshi ; Hirayama, Masaki

Pub. info.:	Semiconductor technology (ISTC 2001) : proceedings of the 1st International Conference on Semiconductor Technology. pp.232-241, 2001. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2001-17

Conference Proceedings

3. DEPENDENCE OF COPPER IMPURITY REMOVAL EFFICIENCY ON SUBSTRATES ETCHING RATE FOR VARIOUS SUBSTRATES IN HYDROFLUORIC SOLUTIONS

Choi, Geun-Min ; Morita, Hiroshi ; Morinaga, Hitoshi ; Kim, Jong-Soo ; Ohmi, Tadahiro

Pub. info.:	Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium. pp.272-279, 1999. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	99-36

Conference Proceedings

4. Layer-by-layer Oxidation of Silicon*

Hattori, Takeo ; Takahashi, Kensuke ; Nohira, Hiroshi ; Ohmi, Tadahiro

Pub. info.:	Semiconductor technology (ISTC 2001) : proceedings of the 1st International Conference on Semiconductor Technology. pp.169-173, 2001. Pennington, N.J.. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	2001-17

Conference Proceedings

5. PROPOSAL OF ADVANCED WET CLEANING OF SILICON SURFACE

Ohmi, Tadahiro

Pub. info.:	Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.1-12, 1995. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	95-20

Conference Proceedings

6. *IN SITU CONTROL OF NATIVE OXIDE GROWTH FOR SEMICONDUCTOR PROCESSES

Morita, Mizuho ; Ohmi, Tadahiro

Pub. info.:	Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.. pp.19-30, 1992. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	259

Conference Proceedings

7. Ultraclean Welding for High Grade Gas Handling Technology

Morin, Michel ; Miyoshi, Shinji ; Kawada, Koji ; Ohmi, Tadahiro

Pub. info.:	Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing II. pp.295-305, 1994. Pennington, NJ. Electrochemical Society
Title of ser.:	Electrochemical Society Proceedings Series
Ser. no.:	1994-3

Conference Proceedings

8. Depth Profile of Point Defects in Ion Implanted n+p and p+n Junctions Formed by 450｡？Post-Implantation Annealing and Impact of Defects on Junction Characteristics

Oka, Mauricio Massazumi ; Nakada, Akira ; Tamai, Yukio ; Kanemoto, Kei ; Shibata, Tadashi ; Ohmi, Tadahiro

Pub. info.:	Defects in electronic materials II : symposium held December 2-6, 1996, Boston, Massachusetts, U.S.A.. pp.163-, 1997. Pittsburgh, Penn. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	442

Conference Proceedings

9. THE ADHESION AND THE PROTECTION OF METALLIC IMPURITIES AT THE INTERFACE OF Si WAFER SURFACE WITH ANION SPECIES

Aomi, Hideki ; Derouin, Francois ; Ohmi, Tadahiro

Pub. info.:	Surface chemical cleaning and passivation for semiconductor processing. pp.333-, 1993. Pittsburgh, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	315

10.

Conference Proceedings

10. METAL REMOVAL BY WAFER SPIN CLEANING PROCESS WITH ADVANCED CHEMICAL DISTRIBUTION SYSTEM

Kunimoto, Fumitomo ; Ohmi, Tadahiro ; Kern, Frederick W., Jr.

Pub. info.:	Surface chemical cleaning and passivation for semiconductor processing. pp.313-, 1993. Pittsburgh, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	315

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