1.

Conference Proceedings
Conference Proceedings
1. SEM metrology for advanced lithographies
B. Bunday ; J. Allgair ; B. J. Rice ; J. Byers ; Y. Avitan ; R. Peltinov ; M. Bar-zvi ; O. Adan ; J. Swyers ; R. Z. Shneck
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
2.

Conference Proceedings
Conference Proceedings
2. The coming of age of tilt CD-SEM
B. Bunday ; J. Allgair ; E. Solecky ; C. Archie ; N. G. Orji ; J. Beach ; O. Adan ; R. Peltinov ; M. Bar-zvi ; J. Swyers
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
3.

Conference Proceedings
Conference Proceedings
3. Metrology challenges for advanced lithography techniques
I. Englard ; P. Vanoppen ; J. Finders ; I. Minnaert-Janssen ; F. Duray ; J. Meessen ; G. Janssen ; O. Adan ; L. Gershtein ; R. Peltinov ; C. Masia ; R. Piech
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
4.

Conference Proceedings
Conference Proceedings
4. MacroCD contact ellipticity measurement for lithography tool qualification
I. Englard ; E. van Setten ; G. Janssen ; P. Vanoppen ; I. Minnaert-Janssen ; F. Duray ; O. Adan ; A. Moran ; L. Gershtein ; R. Peltinov
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518