1.

Conference Proceedings
Conference Proceedings
1. Current status of ASET-HIT EUV phase-shifting point diffraction interferometer
Gomel,Y. ; Sugisaki,K. ; Zhu,Y. ; Niibe,M. ; Watanabe,T. ; Kinoshita,H.
Pub. info.: Soft X-ray and EUV imaging systems II : 31 July-1 August 2001, San Diego, USA.  pp.39-45,  2001.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4506
2.

Conference Proceedings
Conference Proceedings
2. Three-aspherical-mirror system for EUV lithography (Invited Paper)
Kinoshita,H. ; Watanabe,T. ; Niibe,M. ; Ito,M. ; Oizumi,H. ; Yamanashi,H. ; Murakami,K. ; Oshino,T. ; Platonov,Y.Y. ; Grupido,N.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.20-31,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
3.

Conference Proceedings
Conference Proceedings
3. Present status of the ASET at-wavelength phase-shifting polnt diffraction interferometer
Sugisaki,K. ; Zhu,Y. ; Gomei,Y. ; Niibe,M. ; Watanabe,T. ; Kinoshita,H.
Pub. info.: Soft X-ray and EUV imaging systems : 3-4 August 2000, San Diego, USA.  pp.47-53,  2000.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4146
4.

Conference Proceedings
Conference Proceedings
4. Mask technology of extreme-ultraviolet lithography (Invited Paper)
Kinoshita,H. ; Wantanabe,T. ; Ozawa,A. ; Niibe,M.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.358-368,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412