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11 results

Conference Proceedings

1. Development of EUV point diffraction interferometry using the NewSUBARU undulator radiation

Niibe, M. ; Mukai, M. ; Tanaka, T. ; Sugisaki, K. ; Zhu, Y. ; Gomei, Y.

Pub. info.:	X-ray mirrors, crystals, and multilayers II : 10-11 July 2002, Seattle, Washington, USA. pp.204-211, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4782

Conference Proceedings

2. Comparisons between EUV at-wavelength metrological methods [5921-15]

Sugisaki, K. ; Okada, M. ; Zhu, Y. ; Otaki, K. ; Liu, Z. ; Kawakami, J. ; Ishii, M. ; Saito, J. ; Murakami, K. ; Hasegawa, M. ; Ouchi, C. ; Kato, S. ; Hasegawa, T. ; Suzuki, K. ; Yokota, H. ; Niibe, M. ; Takeda, M.

Pub. info.:	Advances in metrology for x-ray and EUV optics : 2-3 August 2005, San Diego, California, USA. pp.59210D-, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5921

Conference Proceedings

3. Design of LIGA beamline using a multilayer-coated reflection mirror

Kinoshita, H. ; Kimpara, Y. ; Uruga, T. ; Watanabe, T. ; Niibe, M. ; Platonov, Y. ; Wood, J.L.

Pub. info.:	Advances in mirror technology for synchrotron x-ray and laser applications : 20 July 1998, San Diego, California. pp.2-11, 1998. Bellingham, Wash., USA. SPIE
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3447

Conference Proceedings

4. Preliminary study on systematic optimization of EPL mask infrastructure

Takase, H. ; Gomei, Y. ; Terashima, S. ; Kondo, H. ; Aoki, T. ; Matsunari, S. ; Niibe, M. ; Kakutani, Y.

Pub. info.:	Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA. pp.509-517, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5751

Conference Proceedings

5. EPL performance in 65-nm node metallization technology and beyond

Kakutani, Y. ; Niibe, M. ; Takase, H. ; Terashima, S. ; Kondo, H. ; Matsunari, S. ; Aoki, T. ; Gomei, Y. ; Fukuda, Y.

Pub. info.:	Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA. pp.501-508, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5751

Conference Proceedings

6. A reflectance measurement system for investigating radiation damage to EUVL mirrors in NewSUBARU

Kakutani, Y. ; Niibe, M. ; Kakiuchi, K. ; Takase, H. ; Terashima, S. ; Kondo, H. ; Matsunari, S. ; Aoki, T. ; Gomei, Y. ; Fukuda, Y.

Pub. info.:	Advances in mirror technology for X-ray, EUV lithography, laser, and other applications II : 5 August 2004, Denver, Colorado, USA. pp.47-57, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5533

Conference Proceedings

7. Recent progress of EUV wavefront metrology in EUVA

Hasegawa, M. ; Ouchi, C. ; Hasegawa, T. ; Kato, S. ; Ohkubo, A. ; Suzuki, A. ; Sugisaki, K. ; Okada, M. ; Otaki, K. ; Murakami, K. ; Saito, J. ; Niibe, M. ; Takeda, M.

Pub. info.:	Advances in mirror technology for X-ray, EUV lithography, laser, and other applications II : 5 August 2004, Denver, Colorado, USA. pp.27-36, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5533

Conference Proceedings

8. ASET development of at-wavelength phase-shifting point diffraction interferometer

Sugisaki, K. ; Zhu, Y. ; Gomei, Y. ; Niibe, M.

Pub. info.:	Emerging Lithographic Technologies VI. Part Two pp.695-701, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4688

Conference Proceedings

9. EUV wavefront metrology system in EUVA

Hasegawa, T. ; Ouchi, C. ; Hasegawa, M. ; Kato, S. ; Suzuki, A. ; Sugisaki, K. ; Murakami, K. ; Saito, J. ; Niibe, M.

Pub. info.:	Emerging Lithographic Technologies VIII. pp.797-807, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5374

10.

Conference Proceedings

10. Lateral shearing interferometer for EUVL: theoretical analysis and experiment

Zhu, Y. ; Sugisaki, K. ; Ouchi, C. ; Hasegawa, M. ; Niibe, M. ; Suzuki, A. ; Murakami, K.

Pub. info.:	Emerging Lithographic Technologies VIII. pp.824-832, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5374

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Author: Niibe, M.