1.

Conference Proceedings
Conference Proceedings
1. Extended process window using variable transmission PSM materials for 65 nm and 45 nm node [6283-120]
Koepernik, C. ; Becker, H. ; Brikner, R. ; Buttgereit, U. ; Irmscher, M. ; Nedelmann, L. ; Zibold, A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831D-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
2.

Conference Proceedings
Conference Proceedings
2. Process window enhancement for 45-nm node using alterable transmission phase-shifting materials [6349-19]
Becker, H. ; Renno, M. ; Hess, G. ; Buttgereit, U. ; Koepernik, C. ; Nedelmann, L. ; Irmscher, M. ; Birkner, R. ; Zibold, A. ; Scheruebl, T.
Pub. info.: Photomask Technology 2006.  pp.63490J-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
3.

Conference Proceedings
Conference Proceedings
3. Patterning of Ta/Si02 high transmission EAPSM material for 193nm technology [5853-26]
Koepernik, C. ; Becker, H. W. ; Butschke, J. ; Buttgereit, U. ; Irmscher, M. ; Nedelmann, L. ; Schmidt, F. ; Teuber, S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.463-473,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853