1.

Conference Proceedings
Conference Proceedings
1. Novel fabrication Techniques for Silicon Single-Electron Devices
Takahashi, Y. ; Ono, Y. ; Fujiwara, A. ; Yamazaki, K. ; Nagase, M. ; Namatsu, H. ; Kurihara, K. ; Murase, K.
Pub. info.: Advanced luminescent materials and quantum confinement : proceedings of the international symposium.  pp.302-324,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-22
2.

Conference Proceedings
Conference Proceedings
2. Spin-coatable Al2O3 resists in electron-beam nanolithography
Saifullah, M. S. M. ; Namatsu, H. ; Yamaguchi, T. ; Yamazaki, K. ; Kurihara, K.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.633-642,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
3.

Conference Proceedings
Conference Proceedings
3. Line-edge roughness characterized by polymer aggregates in photoresists
Yamaguchi, T. ; Namatsu, H. ; Nagase, M. ; Kurihara, K. ; Kawai, Y.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.617-624,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
4.

Conference Proceedings
Conference Proceedings
4. New supercritical resist dryer
Namatsu, H.
Pub. info.: Emerging Lithographic Technologies VI.  Part Two  pp.888-895,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
5.

Conference Proceedings
Conference Proceedings
5. Rapid supercritical drying techniques for advanced lithography
Namatsu, H.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.482-489,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
6.

Conference Proceedings
Conference Proceedings
6. Molecular weight effect on line-edge roughness
Yamaguchi, T. ; Yamazaki, K. ; Namatsu, H.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1212-1219,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
7.

Conference Proceedings
Conference Proceedings
7. Generation mechanism of surface roughness in resists: free volume effect on surface roughness
Yamaguchi, T. ; Namatsu, H.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.921-928,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690