1.

Conference Proceedings
Conference Proceedings
1. The study of contact hole for 65nm node with KrF [6283-77]
You, -J. T. ; Ko, -W. S. ; Moon, J. ; Ahn, -B. Y. ; Nam, -H. B. ; Yim, -G. D.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.628336-628336,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
2.

Conference Proceedings
Conference Proceedings
2. Lithography process margin enhancement using illumination based assist pattern [6283-68]
Moon, J. ; Lee, -J. D. ; Sim, -H. G. ; Eum, -D. J. ; Nam, -H. B. ; Yim, G. D.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62832X-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
3.

Conference Proceedings
Conference Proceedings
3. Highly accurate modeling by using 2-dimensional calibration data set for model-based OPC verification [6283-104]
Kim, -K. C. ; Choi, -S. J. ; Nam, -H. B. ; Yim, D.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62830V-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283