1.

Conference Proceedings
Conference Proceedings
1. CD error sensitivity to "sub-killer" defects at k1 near 0.4:II
Nakagawa,K.H. ; Chen,J.F. ; Socha,R.J. ; Dusa,M.V. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Broeke,D.J.van den
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.893-904,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Practical technology path to sub-0.10-ｦﾌm process generations via enhanced optical lithography
Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Nakagawa,K.H. ; Liebchen,A.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.995-1016,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
3.

Conference Proceedings
Conference Proceedings
3. Effects of off-axis illumination and scatterirng-bar optical proximity correction on the impact of lens aberration on 130-nm polygate mask:a simulation study
Nakagawa,K.H. ; Hollerbach,U. ; Chen,J.F.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1070-1078,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
4.

Conference Proceedings
Conference Proceedings
4. Manufacturing an advanced process characterization reticle incorporating halftone biasing
Nakagawa,K.H. ; Broeke,D.Van Den ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F.
Pub. info.: 15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany.  pp.129-134,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3665
5.

Conference Proceedings
Conference Proceedings
5. Binary halftone chromeless PSM technology for λ/4 optical lithography
Chen,J.F. ; Petersen,J.S. ; Socha,R.J. ; Laidig,T.L. ; Wampler,K.E. ; Nakagawa,K.H. ; Hughes,G.P. ; MacDonald,S.S. ; Ng,W.
Pub. info.: Optical Microlithography XIV.  4346  pp.515-533,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346