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Conference Proceedings

1. The coming of age of tilt CD-SEM

B. Bunday ; J. Allgair ; E. Solecky ; C. Archie ; N. G. Orji ; J. Beach ; O. Adan ; R. Peltinov ; M. Bar-zvi ; J. Swyers

Pub. info.:	Metrology, inspection, and process control for microlithography XXI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6518

Conference Proceedings

2. Comparison and uncertainties of standards for critical dimension atomic force microscope tip width calibration

R. Dixson ; N. G. Orji

Pub. info.:	Metrology, inspection, and process control for microlithography XXI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6518

Conference Proceedings

3. Single crystal critical dimension reference materials (SCCDRM): process optimization for the next generation of standards

R. G. Dixson ; W. F. Guthrie ; M. Cresswell ; R. A. Allen ; N. G. Orji

Pub. info.:	Metrology, inspection, and process control for microlithography XXI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6518

Conference Proceedings

4. TEM calibration methods for critical dimension standards

N. G. Orji ; R. G. Dixson ; D. I. Garcia-Gutierrez ; B. D. Bunday ; M. Bishop ; M. W. Cresswell ; R. A. Allen ; J. A. Allgair

Pub. info.:	Metrology, inspection, and process control for microlithography XXI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6518

Conference Proceedings

5. Application of carbon nanotube probes in a critical dimension atomic force microscope

B. C. Park ; J. Choi ; S. J. Ahn ; D. Kim ; J. Lyou ; R. Dixson ; N. G. Orji ; J. Fu ; T. V. Vorburger

Pub. info.:	Metrology, inspection, and process control for microlithography XXI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6518

Conference Proceedings

6. Re-calibration of the NIST SRM 2059 master standard using traceable atomic force microscope metrotogy

R. Dixson ; J. Potzick ; N. G. Orji

Pub. info.:	Photomask technology 2008. 2 pp.71222Q-1-71222Q-12, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7122

Conference Proceedings

7. Photomask applications of traceable atomic force microscope dimensional metrology at NIST

R. Dixson ; N. G. Orji ; J. Potzick ; J. Fu ; R. A. Allen

Pub. info.:	Photomask technology 2007. 2 pp.67303D-1-67303D-13, 2007. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6730

Conference Proceedings

8. Toward accurate feature shape metrology

N. G. Orji ; R. G. Dixson ; B. D. Bunday ; J. A. Allgair

Pub. info.:	Metrology, inspection, and process control for microlithography XXII. 1 pp.692208-1-692208-9, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6922

Conference Proceedings

9. Characterization of CD-SEM metrology for iArF photoresist materials

A. Bunday ; A. Cordes ; N. G. Orji ; E. Piscani ; D. Cochran

Pub. info.:	Metrology, inspection, and process control for microlithography XXII. 1 pp.69221A-1-69221A-16, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6922

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Conference Proceedings

10. Accuracy considerations for critical dimension semiconductor metrology

N. G. Orji ; R. G. Dixson ; B. D. Bunday ; J. A. Allgair

Pub. info.:	Instrumentation, metrology, and standards for nanomanufacturing II : 10 August 2008, San Diego, California, USA. pp.70420A-1-70420A-11, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7042

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Author: N. G. Orji