1.

Conference Proceedings
Conference Proceedings
1. Photoresist focus exposure matrix (FEM) measurements using critical-dimension atomic force microscopy (CD AFM)
Meyyappan,A. ; Muckenhirn,S.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.631-641,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
2.

Conference Proceedings
Conference Proceedings
2. Critical-dimension atomic force microscope (CD-AFM) measurement of masks
Muckenhirn,S. ; Meyyappan,A.
Pub. info.: Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California.  pp.642-653,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3332
3.

Conference Proceedings
Conference Proceedings
3. "Measurement of sidewall, line, and line-edge roughness with scanning probe microscopy"
Walch,K. ; Meyyappan,A. ; Muckenhirn,S. ; Margail,J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.726-732,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
4.

Conference Proceedings
Conference Proceedings
4. Foot (bottom corner) measurement of a structure with SPM
Meyyappan,A. ; Klos,M.A. ; Muckenhirn,S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.733-738,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
5.

Conference Proceedings
Conference Proceedings
5. SPM characterizaton of anomalies in phase-shift mask and their effect on wafer features
Muckenhirn,S. ; Meyyappan,A. ; Walch,K. ; Maslow,M.J. ; Vandenberghe,G.N. ; Wingerden,J.Van
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.188-199,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344