1.

Conference Proceedings
Conference Proceedings
1. DEPENDENCE OF COPPER IMPURITY REMOVAL EFFICIENCY ON SUBSTRATES ETCHING RATE FOR VARIOUS SUBSTRATES IN HYDROFLUORIC SOLUTIONS
Choi, Geun-Min ; Morita, Hiroshi ; Morinaga, Hitoshi ; Kim, Jong-Soo ; Ohmi, Tadahiro
Pub. info.: Cleaning technology in semiconductor device manufacturing : proceedings of the sixth international symposium.  pp.272-279,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-36
2.

Conference Proceedings
Conference Proceedings
2. Advanced AlKali Cleaning Solution for Simplification of Semiconductor Cleaning Process
Morinaga, Hitoshi ; Aoki, Masumi ; Maeda, Toshiaki ; Fujisue, Masaya ; Tanaka, Hiroyuki ; Toyoda, Minoru
Pub. info.: Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A..  pp.35-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 477
3.

Conference Proceedings
Conference Proceedings
3. Recent Advances in Wet Processing Technology and Science
Verhaverbeke, Steven ; Messoussi, Rochdi ; Morinaga, Hitoshi ; Ohmi, Tadahiro
Pub. info.: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.3-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 386
4.

Conference Proceedings
Conference Proceedings
4. IMPURITIES ON Si SURFACES ELECTROCHEMiCAL DEPOSITION AND REMOVAL OF METALLIC IMPURITIES ON SILICON SURFACES
Morinaga, Hitoshi ; Ohmi, Tadahiro
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.257-268,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20