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21 results

Conference Proceedings

1. Advanced mask technology for 230-mm reticle fabrication

Hiruta,K. ; Kubo,S. ; Iwamatsu,T. ; Fujisawa,T. ; Sugiyama,M. ; Morimoto,H.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.853-857, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

2. Feasibility study of an embedded transparent phase-shifting mask in ArF lithography

Matsuo,T. ; Ogawa,T. ; Morimoto,H.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.443-451, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

3. ZrSiO:a new and robust material for attenuated phase-shift mask in ArF Lithography

Onodera,T. ; Matsuo,T. ; Nakazawa,K. ; Miyazaki,J. ; Ogawa,T. ; Morimoto,H. ; Haraguchi,T. ; Fukuhara,N. ; Otaki,M. ; Takeuchi,S.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.337-343, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

4. Study of bilayer negative-tone silylation process for 193-nm lithography

Watanabe,H. ; Satou,I. ; Endo,M. ; Morimoto,H.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part2 pp.980-991, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

5. Temperature dependence of acid molecular diffusion in resist polymer films simulated by molecular dynamics

Toriumi,M. ; Okabe,I. ; Ohfuji,T. ; Endo,M. ; Morimoto,H.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part2 pp.1056-1061, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

6. Evaluation of an advanced mask-writing system:II

Kvbo,S. ; Hiruta,K. ; Sugiyama,M. ; Iwamatsu,T. ; Fujisawa,T. ; Morimoto,H.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part1 pp.532-541, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

7. Evaluation of loading effect of NLD dry etching: ？

Fujisawa,T. ; Iwamatsu,T. ; Hiruta,K. ; Morimoto,H. ; Harashima,N. ; Sasaki,T. ; Hara,M. ; Yamashiro,K. ; Ohkubo,Y. ; Takehana,Y.

Pub. info.:	20th Annual BACUS Symposium on Photomask Technology. pp.549-552, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4186

Conference Proceedings

8. Present status of ArF lithography development and mask technology (Invited Paper)

Morimoto,H. ; Ohtsuka,H.

Pub. info.:	Photomask and X-Ray Mask Technology V. pp.338-340, 1998. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3412

Conference Proceedings

9. CrOxFy as a material for attenuated phase-shift masks in ArF lithography

Nakazawa,K. ; Matsuo,T. ; Onodera,T. ; Morimoto,H. ; Mohri,H. ; Hatsuta,C. ; Hayashi,N.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.682-687, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

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Conference Proceedings

10. Advanced FIB mask repair technology in ArF lithography

Hiruta,K. ; Kubo,S. ; Morimoto,H. ; Yasaka,A. ; Hagiwara,R. ; Adachi,T. ; Morikawa,Y. ; Iwase,K. ; Hayashi,N.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology VII. pp.523-530, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4066

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Author: Morimoto,H.