Kotani, T. ; Tanaka, S. ; Nojima, S. ; Hashimoto, K. ; Inoue, S. ; Mori, I.
Pub. info.:
Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA. pp.128-138, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Nakasugi, T. ; Ando, A. ; Inanami, R. ; Sasaki, N. ; Ota, T. ; Nagano, O. ; Yamazaki, Y. ; Sugihara, K. ; Mori, I. ; Miyoshi, M. ; Okumura, K. ; Miura, A.
Pub. info.:
Emerging Lithographic Technologies VII. 2 pp.1051-1058, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Hasebe, S. ; Nojima, S. ; Mimotogi, S. ; Tanaka, S. ; Ikenaga, O. ; Hashimoto, K. ; Inoue, S. ; Mori, I.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology X. pp.593-599, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Nojima, S. ; Mimotogi, S. ; Itoh, M. ; Ikenaga, O. ; Hasebe, S. ; Hashimoto, S. ; Inoue, S. ; Goto, M. ; Mori, I.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology IX. pp.33-42, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering