1.

Conference Proceedings
Conference Proceedings
1. Practical methodology of optical proximity correction in subquarter-micron lithography
Lim,C.-M. ; Seo,J.-W. ; Kang,C.-S. ; Park,Y.-S. ; Yoon,J.-T. ; Lee,C.-S. ; Moon,S.-C. ; Kim,B.-H.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.666-674,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Compensation of intrafield registration error caused by process properties in optical lithography
Lee,T.-G. ; Moon,S.-C. ; Lee,H.-M. ; Kim,J.-S. ; Lee,C.-S. ; Kim,H.-Y. ; Park,H.-K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography X.  pp.365-378,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2725