1.

Conference Proceedings
Conference Proceedings
1. Chemically amplified resist based on the methacrylate polymer with 2-trimethylsilyl-2-propyl ester protecting group
Kim, J. -B. ; Kim, H. ; Lee, S. -H. ; Choi, S. -J. ; Moon, J. -T.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.420-428,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Macro analysis of line edge and line width roughness [6152-33]
Shin, J. ; Yoon, J. ; Jung, Y. ; Lee, S. ; Woo, S. G. ; Cho, H. -K. ; Moon, J. -T.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61520X-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152