1.

Conference Proceedings
Conference Proceedings
1. Ultrashallow Junctions and Salicide Technology for Advanced CMOS Devices
Ohguro, T. ; Nakamura, S. ; Saito, M. ; Ono, S. ; Harakawa, H. ; Morifuji, E. ; Yoshitomi, T. ; Morimoto, T. ; Momose, H.S. ; Katsumata, Y. ; Iwai, H.
Pub. info.: ULSI science and technology, 1997 : proceedings of the Sixth International Symposium on Ultralarge Scale Integration Science and Technology.  pp.275-296,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-3
2.

Conference Proceedings
Conference Proceedings
2. Ultrathin Oxide Technology
Momose, H.S. ; Ohguro, T. ; Nakamura, S. ; Katsumata, Y. ; Iwai, H.
Pub. info.: ULSI science and technology, 1997 : proceedings of the Sixth International Symposium on Ultralarge Scale Integration Science and Technology.  pp.235-246,  1997.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 97-3
3.

Conference Proceedings
Conference Proceedings
3. Silicon Epitaxy and Its Application to RF ICs
Ohguro, T. ; Naruse, H. ; Sugaya, H. ; Nakamura, S. ; Sugiyama, N. ; Morifuji, E. ; Kimijima, H. ; Yoshitomi, T. ; Morimoto, T. ; Momose, H.S. ; Katsumata, Y. ; Iwai, H.
Pub. info.: ULSI process integration : proceedings of the first international symposium.  pp.123-142,  1999.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 99-18
4.

Conference Proceedings
Conference Proceedings
4. Ultra-Thin Gate SiO2 Technology
Iwal, H. ; Momose, H.S. ; Ohrni, S.-I.
Pub. info.: The physics and chemistry of SiO2 and the Si-SiO2 interface-4, 2000 : proceedings of the fourth International Symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, Tronto, Canada, May 15-18, 2000.  pp.3-18,  2000.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2000-2
5.

Conference Proceedings
Conference Proceedings
5. Si Channel Surface Dependence of Electrical Characteristics in Ultra-Thin Gate Oxide CMOS*
Momose, H.S.
Pub. info.: ULSI Process Integration : proceedings of the International Symposium.  pp.361-374,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-6