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25 results

Conference Proceedings

1. Investigation of plasma-induced erosion of multilayer condenser optics

Tanaka, Y. ; Oizumi, H. ; Hashimoto, T. ; Kumasaka, F. ; Nishiyama, I. ; Abe, T. ; Mohri, H. ; Hayashi, N.

Pub. info.:	Emerging lithographic technologies IX : 1-3 March 2005, San Jose, California, USA. pp.128-139, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5751

Conference Proceedings

2. R-mask: a new concept and its application for small-volume production

Hayano, K. ; Hotta, S. ; Hasegawa, N. ; Hosono, K. ; Tanaka, T. ; Suko, K. ; Sasaki, S. ; Mohri, H. ; Hoga, M. ; Hayashi, N.

Pub. info.:	24th Annual BACUS Symposium on Photomask Technology. pp.257-268, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5567

Conference Proceedings

3. 45-32-nm node photomask technology with water immersion lithography [6349-134]

Adachi, T. ; Inazuki, Y. ; Sutou, T. ; Morikawa, Y. ; Toyama, N. ; Mohri, H. ; Hayashi, N.

Pub. info.:	Photomask Technology 2006. pp.63493J-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

4. Process development for EUV mask production [6349-131]

Abe, T. ; Fujii, A. ; Sasaki, S. ; Mohri, H. ; Hayashi, N. ; Shoki, T. ; Yamada, T. ; Nozawa, O. ; Ohkubo, R. ; Ushida, M.

Pub. info.:	Photomask Technology 2006. pp.63493G-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

5. In-field CD uniformity control by altering transmission distribution of the photomask using ultra fast pulsed laser technology [6283-29]

Morikawa, Y. ; Sutou, T. ; Inazuki, Y. ; Adachi, T. ; Yoshida, Y. ; Kojima, K. ; Sasaki, S. ; Mohri, H. ; Hayashi, N. ; Dmitriev, V. ; Oshemkov, S. ; Zait, E. ; Ben-Zvi, G.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831Y-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

Conference Proceedings

6. Dry etch technology development for NIL template [6283-87]

Yoshida, Y. ; Amano, T. ; Sasaki, S. ; Itoh, K. ; Toyama, N. ; Mohri, H. ; Hayashi, N.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62833G-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

Conference Proceedings

7. Mechanism of megasonic damages for micropatterns [6349-113]

Suwa, Y. ; Shimada, S. ; Shigihara, A. ; lshii, H. ; Shoji, Y. ; Otsuki, M. ; Naito, A. ; Sasaki, S. ; Mohri, H. ; Hayashi, N.

Pub. info.:	Photomask Technology 2006. pp.63492X-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

8. Evaluation of defect repair of EUV mask absorber layer [5853-74]

Abe, T. ; Amano, T. ; Mohri, H. ; Hayashi, N. ; Tanaka, Y. ; Kumasaka, F. ; Nishiyama, I.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.866-873, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

9. Feasibility study of SCAAM-type Alt-PSM for 157-nm lithography

Morikawa, Y. ; Kokubo, H. ; Noguchi, K. ; Sasaki, S. ; Mohri, H. ; Hoga, M. ; Kanda, N. ; Irie, S. ; Watanabe, K. ; Suganaga, T. ; Itani, T.

Pub. info.:	Optical Microlithography XVI. Part Two pp.1137-1145, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

10.

Conference Proceedings

10. Development of attenuating PSM shifter for F2 and high-transmission ArF lithography

Nozawa, O. ; Shiota, Y. ; Mitsui, H. ; Suzuki, T. ; Ohkubo, Y. ; Ushida, M. ; Yusa, S. ; Nishimura, T. ; Noguchi, K. ; Sasaki, S. ; Mohri, H. ; Hayashi, N.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.39-50, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

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Author: Mohri, H.