1.

Conference Proceedings
Conference Proceedings
1. Simple estimation of lens aberration with pinhole aperture on the backside of photomask
Nakao, S. ; Maejima, S. ; Ymashita, S. ; Miyazaki, J. ; Tokui, A. ; Tsujita, K. ; Arimoto, I.
Pub. info.: Optical Microlithography XV.  Part One  pp.25-32,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Conference Proceedings
Conference Proceedings
2. Zero MEF hole formation with Atten-PSM and modified illumination
Nakao, S. ; Miyagi, T. ; Tarutani, S. ; Yamashita, S. ; Miyazaki, J. ; Kozawa, H. ; Tokui, A. ; Tsujita, K.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1258-1269,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Attenuated phase-shifting mask in ArF lithography
Miyazaki, J. ; Uematsu, M. ; Nakazawa, K. ; Matsuo, T. ; Onodera, T. ; Ogawa, T.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.324-331,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
4.

Conference Proceedings
Conference Proceedings
4. Implementation of phase-shift focus monitor with modified illumination
Nakao, S. ; Maejima, S. ; Ueno, A. ; Yamashita, S. ; Miyazaki, J. ; Tokui, A. ; Tsujita, K. ; Arimoto, I.
Pub. info.: Optical Microlithography XV.  Part Two  pp.918-926,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Simple focus monitoring by eccentric illumination aperture
Nakao, S. ; Maejima, S. ; Tamada, N. ; Yamashita, S. ; Ueno, A. ; Miyazaki, J. ; Tokui, A. ; Tsujita, K. ; Arimoto, I.
Pub. info.: Optical Microlithography XV.  Part Two  pp.765-773,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691