1.

Conference Proceedings
Conference Proceedings
1. Line-narrowed ArF excimer laser for 193-nm lithography
Saito,T. ; Mitsuhashi,K. ; Arai,M. ; Seki,K. ; Tada,A. ; Igarashi,T. ; Hotta,K.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.1069-1075,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. High-repetition-rate ArF excimer laser for 193-nm lithography
Kakizaki,K. ; Saito,T. ; Mitsuhashi,K. ; Arai,M. ; Tada,A. ; Kasahara,S. ; Igarashi,T. ; Hotta,K.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1397-1404,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Ultranarrow-bandwidth 4-kHz ArF excimer laser for 193-nm lithography
Saito,T. ; Matsunaga,T. ; Mitsuhashi,K. ; Terashima,K. ; Ohta,T. ; Tada,A. ; Ishihara,T. ; Yoshino,M. ; Tsushima,H. ; Enami,T. ; Tomaru,H. ; Igarashi,T.
Pub. info.: Optical Microlithography XIV.  4346  pp.1229-1237,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346