1.

Conference Proceedings
Conference Proceedings
1. Development of an incremental structural parameter model for predicting reactive ion etch rates of 193-nm photoresist polymer platforms
Wallow, T. I. ; Brock, P. J. ; DiPietro, R. A. ; Allen, R. D. ; Opitz, J. ; Sooriyakumaran, R. ; Hofer, D. C. ; Mewherter, A. M. ; Cui, Y. ; Yan, W. ; Worth, G. ; Moreau, W. M. ; Meute, J. ; Byers, J. D. ; Rich, G. K. ; McCallum, M. ; Jayaraman, S. ; Vicari, R. ; Cagle, J. ; Sun, S. ; Hullihen, K. A.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.26-35,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. 193-nm single-layer process for 150-nm technology generation and below
Amblard, G. R. ; Zandbergen, P. ; McCallum, M. ; Stephen, A. ; Byers, J. D. ; Dean, K. R. ; Meute, J. ; Nelson, C. M.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.810-827,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
3.

Conference Proceedings
Conference Proceedings
3. The capability of a 1.3NA -stepper using 3D EMF mask simulations [5853-66]
Conley, W. ; Meute, J. ; Webb, J. ; Goodman, D. ; Maier, R.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.808-817,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
4.

Conference Proceedings
Conference Proceedings
4. Image performance and mask characterization of 157-nm alternating phase-shifting mask
Chen, Y.-T. ; Meute, J. ; Dean, K.R. ; Stark, D.R. ; Schilz, C.M. ; Dettmann, W. ; Koehle, R. ; Schiessl, B. ; Degel, W.
Pub. info.: Optical Microlithography XVI.  Part One  pp.618-628,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
5.

Conference Proceedings
Conference Proceedings
5. Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH
Meute, J. ; Rich, G.K. ; Hien, S. ; Dean, K.R. ; Gondran, C. ; Cashmore, J.S. ; Ashworth, D. ; Webb, J.E. ; Rich, L.R. ; Dewa, P.G.
Pub. info.: Optical Microlithography XV.  Part One  pp.724-733,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
6.

Conference Proceedings
Conference Proceedings
6. Aberration determination in early 157-nm exposure system
Smith, B.W. ; Conley, W. ; Garza, C.M. ; Meute, J. ; Miller, D.A. ; Rich, G.K. ; Graffenberg, V. ; Dean, K.R. ; Patel, S. ; Ford, A. ; Foster, J. ; Moers, M.H. ; Cummings, K.D. ; Webb, J.E. ; Dewa, P.G. ; Zerrade, A. ; McDonald, S.S. ; Hughes, G.P. ; Dirksen, P.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1635-1643,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
7.

Conference Proceedings
Conference Proceedings
7. Characterization and acid diffusion measurements of new strong acid photoacid generators
Wallraff, G.M. ; Larson, C.E. ; Fender, N. ; Davis, B. ; Medeiros, D.R. ; Meute, J. ; Lamanna, W.M. ; Parent, M.J. ; Robeledo, T. ; Young, G.L.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.160-168,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
8.

Conference Proceedings
Conference Proceedings
8. 157-nm alternating phase-shifting mask design and high-NA images
Chen, Y.-T. ; Meute, J. ; Dean, K. ; Brooker, P.D.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.905-912,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
9.

Conference Proceedings
Conference Proceedings
9. Correction of 157-nm lens based on phase ring aberration extraction method
Meute, J. ; Rich, G.K. ; Conley, W. ; Smith, B.W. ; Zavyalova, L.V. ; Cashmore, J.S. ; Ashworth, D. ; Webb, J.E. ; Rich, L.
Pub. info.: Optical Microlithography XVII.  pp.195-203,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377