1.

Conference Proceedings
Conference Proceedings
1. Theoretical calculations of photoabsorption of polymers in the EUV (extreme ultraviolet) region
Matsuzawa,N.N. ; Irie,S. ; Yano,E. ; Okazaki,S. ; Ishitani,A.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.278-284,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
2.

Conference Proceedings
Conference Proceedings
2. Recent advantages of bilevel resists based on silsesquioxane for ArF lithography
Morisawa,T. ; Matsuzawa,N.N. ; Mori,S. ; Kaimoto,Y. ; Endo,M. ; Ohfuji,T. ; Kuhara,K. ; Sasago,M.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.484-492,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
3.

Conference Proceedings
Conference Proceedings
3. Resist cluster formation model and development simulation
Kamon,K. ; Nakazawa,K. ; Yamaguchi,A. ; Matsuzawa,N.N. ; Ohfuji,T. ; Sasago,M. ; Kanzaki,K. ; Tagawa,S.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.472-483,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
4.

Conference Proceedings
Conference Proceedings
4. Theoretical calculations of silylation reaction of photoresists
Matsuzawa,N.N. ; Mori,S. ; Morisawa,T. ; Kaimoto,Y. ; Endo,M. ; Ohfuji,T. ; Kuhara,K. ; Sasago,M.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.493-502,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
5.

Conference Proceedings
Conference Proceedings
5. Theoretical calculations of photoabsorption of molecules in the vacuum ultraviolet region
Matsuzawa,N.N. ; Mori,S. ; Yano,E. ; Okazaki,S. ; Ishitani,A. ; Dixon,D.A.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.375-384,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
6.

Conference Proceedings
Conference Proceedings
6. Dissolution-rate analysis of ArF resist polymers based on the percolation model
Yamaguchi,A. ; Kishimura,S. ; Matsuzawa,N.N. ; Ohfuji,T. ; Tanaka,T. ; Tagawa,S. ; Sasago,M.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.601-610,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
7.

Conference Proceedings
Conference Proceedings
7. High-silicon-concentration TSI process for 193-nm lithography
Mori,S. ; Morisawa,T. ; Matsuzawa,N.N. ; Kaimoto,Y. ; Endo,M. ; Matsuo,T. ; Kuhara,K. ; Ohfuji,T. ; Sasago,M.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 1  pp.587-594,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
8.

Conference Proceedings
Conference Proceedings
8. Control of line edge roughness of ultrathin resist films subjected to EUV exposure
Ryoo,M. ; Shirayone,S. ; Oizumi,H. ; Matsuzawa,N.N. ; Irie,S. ; Yano,E. ; Okazaki,S.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.903-911,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
9.

Conference Proceedings
Conference Proceedings
9. Theoretical calculations of photoabsorption of several alicyclic molecules in the vacuum ultraviolet region
Matsuzawa,N.N. ; Ishitani,A. ; Dixon,D.A. ; Uda,T.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.396-405,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345