1.

Conference Proceedings
Conference Proceedings
1. 25 Atomic Vapor Deposition of Ru and RuO2 Thin Film Layers for Metal Gate Applications
Manke, C. ; Boissiere, O. ; Baumann, P. ; Lindner, J. ; Schumacher, M.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.207-214,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
2.

Conference Proceedings
Conference Proceedings
2. 34 Improving CMOS performance by AVD〓 grown high-k dielectrics and advanced metal electrodes
Weber, U. ; Boissiere, O. ; Lindner, J. ; Schumacher, M. ; Lehnen, P. ; Manke, C. ; Van Elshocht, S. ; Caymax, M. ; Cosnier, V. ; McEntee, T.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.293-300,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
3.

Conference Proceedings
Conference Proceedings
3. Kinetics of Pt Silicide Formation Studied by Spectral Ellipsometry
Schwarz, R. ; Dittrich, A. ; Zhou, S. M. ; Hundhausen, M. ; Ley, L. ; Chen, L. Y. ; Woerle, D. ; Manke, C. ; Schulz, M.
Pub. info.: Rapid thermal and integrated processing VI : symposium held April 1-4, 1997, San Francisco, California, U.S.A..  pp.259-,  1997.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 470