1.

Conference Proceedings
Conference Proceedings
1. Using the CODE technique to print complex two-dimensional structures in a 90-nm ground rule process
Manakli, S. ; Trouiller, Y. ; Toublan, O. ; Schiavone, P. ; Rody, Y.F. ; Goirand, P.J.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.205-213,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
2.

Conference Proceedings
Conference Proceedings
2. Understanding of the depth of focus evolution from an analysis of the iso-focal point
Manakli, S. ; Trouiller, Y. ; Schiavone, P.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1750-1761,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. Gate imaging for 0.09-μm logic technology: comparison of single exposure with assist bars and the CODE approach
Trouiller, Y. ; Belledent, J. ; Chapon, J.D. ; Rousset, V. ; Rody, Y.F. ; Manakli, S. ; Goirand, P.-J.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1231-1240,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Complementary double-exposure technique (CODE): a way to print 80-nm gate level using a double-exposure binary mask approach
Manakli, S. ; Trouiller. Y. ; Toublan, O. ; Schiavone, P. ; Miramond, C. ; Rody, Y.F. ; Sundermann, F. ; Chapon, J.D. ; Goirand, P.-J.
Pub. info.: Optical Microlithography XV.  Part One  pp.491-502,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. ArF imaging with off-axis illumination and subresolution asist bars: a compromise between mask constraints an lithographic process constraints
Trouiller, Y. ; Serrand, J. ; Miramond, C. ; Rody, Y.F. ; Manakli, S. ; Goirand, P.-J.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1522-1529,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
6.

Conference Proceedings
Conference Proceedings
6. Manufacturing concerns for advanced CMOS circuit realization EBDW alternative solution for cost and cycle time reductions
Pain, L. ; Jurdit, M. ; LaPlanche, Y.T. ; Todeschini, J. ; Manakli, S. ; Bervin, G. ; Palla, R. ; Beverina, A. ; Faure, R. ; Bossy, X. ; Leininger, H. ; Tourniol, S. ; Broekaart, M. ; Judong, F. ; Brosselin, K. ; Gouraud, P. ; De Jonghe, V. ; Henry, D. ; Woo, M. ; Stolk, P. ; Tavel, B. ; Arnaud, F.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.590-600,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374