1.

Conference Proceedings
Conference Proceedings
1. Characterizing the process window of a double-exposure dark-field alternating phase-shift mask
Mack, C.A.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.454-464,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
2.

Conference Proceedings
Conference Proceedings
2. Measuring and modeling flare in optical lithography
Mack, C.A.
Pub. info.: Optical Microlithography XVI.  Part One  pp.151-161,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
3.

Conference Proceedings
Conference Proceedings
3. Methods for benchmarking photolithography simulators
Smith, M.D. ; Mack, C.A.
Pub. info.: Optical Microlithography XVI.  Part One  pp.57-68,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Theoretical analysis of the potential for maskless lithography
Mack, C.A.
Pub. info.: Optical Microlithography XV.  Part One  pp.98-106,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. The end of the semiconductor industry as we know it (Plenary Paper)
Mack, C.A.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.1-11,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
6.

Conference Proceedings
Conference Proceedings
6. New die-to-database inspection algorithm for inspection of 90-nm node reticles
Garcia, H.I. ; Volk, W.W. ; Watson, S. ; Hess, C. ; Aquino, C. ; Wiley, J. ; Mack, C.A.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.364-374,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
7.

Conference Proceedings
Conference Proceedings
7. Process sensitivity and optimization with full and simplified resist models
Smith, M.D. ; Mack, C.A.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1509-1520,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
8.

Conference Proceedings
Conference Proceedings
8. PRIMADONNA: a system for automated defect disposition of production masks using wafer lithography simulation
Bald, D.J. ; Munir, S. ; Lieberman, B. ; Howard, W.H. ; Mack, C.A.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.263-270,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
9.

Conference Proceedings
Conference Proceedings
9. Etch simulations for lithography engineers
Jones, R.L. ; Mack, C.A. ; Byers, J.D.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1232-1242,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
10.

Conference Proceedings
Conference Proceedings
10. Comparison between the process windows calculated with full and simplified resist models
Smith, M.D. ; Byers, J.D. ; Mack, C.A.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1199-1210,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691