1.

Conference Proceedings
Conference Proceedings
1. Progress in 157-nm lithography development at Intel:resists and reticles
Rao,V. ; Panning,E.M. ; Liao,L. ; Hutchinson,J.M. ; Grenville,A. ; Holl,S.M. ; Bruner,D. ; Balasubramanian,R. ; Kuse,R. ; Dao,G.T. ; Zheng,J.-F. ; Orvek,K.J. ; Langston,J.C. ; Lo,F.-C.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1574-1581,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. EUV mask absorber characterization and selection
Yan,P. ; Zhang,G. ; Kofron,P. ; Powers,J.E. ; Tran,M. ; Liang,T. ; Stivers,A.R. ; Lo,F.-C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.116-123,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
3.

Conference Proceedings
Conference Proceedings
3. Current Status of 157-nm mask technology development
Dao,G. ; Kuse,R. ; Orvek,K.J. ; Panning,E.M. ; Remling,R. ; Zheng,J.F. ; Tsubasaki,M. ; Lo,F.-C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.552-563,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
4.

Conference Proceedings
Conference Proceedings
4. Impact of surface contamination on transmittance of modified fused silica for 157-nm lithography application
Zheng,J.-F. ; Kuse,R. ; Ramamoorthy,A. ; Dao,G.T. ; Lo,F.-C.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.767-773,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186