1.

Conference Proceedings
Conference Proceedings
1. 100-nm CMOS gates patterned with 3ｦﾒbelow 10 nm
Liu,H.Y. ; Diaz,C.H. ; Chi,C. ; Kavari,R. ; Cheng,P. ; Cao,M. ; Gleason,R.E. ; Doyle,B.S. ; Greene,W. ; Ray,G.
Pub. info.: Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California.  pp.375-381,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3331
2.

Conference Proceedings
Conference Proceedings
2. 100-nm node lithography with KrF?
Ferri,J.E. ; Tyrrell,B. ; Astolfi,D.K. ; Yost,D. ; Davis,P. ; Wheeler,B. ; Mallen,R. ; Jarmolowicz,J. ; Cann,S.G. ; Liu,H.Y. ; Ma,M. ; Chan,D.Y. ; Rhyins,P.D. ; Carney,C. ; Ferri,J.E. ; Blachowicz,B.A.
Pub. info.: Optical Microlithography XIV.  4346  pp.191-204,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346