1.

Conference Proceedings
Conference Proceedings
1. Effect of SC-1 Process Parameters on Particle Removal and Surface Metallic Contamination
Hall, R. Mark ; Rosato, John J. ; Jarvis, Taura ; Parry, Thad ; Lindquist, Paul G.
Pub. info.: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.127-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 386
2.

Conference Proceedings
Conference Proceedings
2. Surface Photovoltage Monitoring of Silicon Surface Native and Chemical Oxides Following Wafer Cleaning and Rinsing Operations
Rosato, John J. ; Hall, R. Mark ; Parry, Thad B. ; Lindquist, Paul G. ; Jarvis, Taura D.
Pub. info.: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.47-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 386