1.

Conference Proceedings
Conference Proceedings
1. "Mask defect disposition: flux-area measurement of edge, contact, and OPC defects correlates to wafer and enables effective decisions"
Fiekowsky,P. ; Taylor,D. ; Wang,D. ; Yang,C.C. ; Lin,S.C. ; Tu,L.H. ; Lin,K.R.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.499-506,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
2.

Conference Proceedings
Conference Proceedings
2. New optical metrology for masks: range and accuracy rivals SEM
Cottle,R. ; Fiekowsky,P. ; Hung,C.C. ; Lin,S.C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.612-617,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409
3.

Conference Proceedings
Conference Proceedings
3. Binary mask defect printability for 130-nm ArF lithography
Lin,S.C. ; Chen,J.H. ; Hsu,T.H. ; Hung,J.C.C. ; Lin,J.C.H.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.798-812,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562