1.

Conference Proceedings
Conference Proceedings
1. Improving the performance of E-beam 2nd writing in mask alignment accuracy and pattern faultless for CPL technology
Lee, B. ; Hung, R. ; Lin, O. ; Wu, Y.-H. ; Kozuma, M. ; Shih, C.-L. ; Hsu, M. ; Hsu, S. D.
Pub. info.: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China.  pp.114-121,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5645
2.

Conference Proceedings
Conference Proceedings
2. Synthesis and Characteristics of La1-xSrxMnO3 Ceramics for Cathode Materials of SOFC
Zhong-tai, Z. ; Lin, O. ; Zi-Long, T.
Pub. info.: Proceedings of the Fourth International Symposium on Solid Oxide Fuel Cells (SOFC-IV).  pp.502-511,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-1
3.

Conference Proceedings
Conference Proceedings
3. Advanced hybrid mask process development [6283-23]
Lin, O. ; Chou, J. ; fu, K. K. ; Lee, B. ; Lu, R. ; Lu, J. ; Shi, -L. C.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831S-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
4.

Conference Proceedings
Conference Proceedings
4. Study of chromeless mask quartz defect detection capability for 80-nm post structure [6349-136]
Lu, J. ; Wang, B. ; Chen, F. F. ; Wang, O. ; Chou, J. ; Lin, O. ; Cheng, J. ; Chen, E. ; Yu, P.
Pub. info.: Photomask Technology 2006.  pp.63493K-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
5.

Conference Proceedings
Conference Proceedings
5. Inverse lithography technology at chip scale [6154-41]
Lin, B. ; Shieh, M. F. ; Sun, J. ; Ho, J. ; Wang, Y. ; Wu, X. ; Leitermann, W. ; Lin, O. ; Lin, J. ; Liu, Y. ; Pang, L.
Pub. info.: Optical Microlithography XIX.  pp.615414-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
6.

Conference Proceedings
Conference Proceedings
6. Real-world impacts of inverse lithography technology [5992-72]
Ho, J. ; Wang, Y. ; Wu, X. ; Xilinx Inc. (USA) ; Lin, B. ; Shieh, M. F. ; Sun, J. ; Lin, O. ; Lin, J. ; Liu, Y. ; Pang, L.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59921Z-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
7.

Conference Proceedings
Conference Proceedings
7. Advanced e-beam CAR resist evaluation for 65nm generation [5992-112]
Chan, G. ; Lin, O. ; Tseng, W. ; Lee, B. ; Huang, T. ; Kozuma, M.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59923B-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992