1.

Conference Proceedings
Conference Proceedings
1. Manufacturability and printability of AAPSM with transparent etch stop layer [6281-54]
Cangemi, M. ; Philipsen, V. ; De Ruyter, R. ; Leunissen, L. ; Morgana, N. ; Sixt, P. ; Cangemi, M. ; Cottle, R. ; Kasprowicz, B.
Pub. info.: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.62810T-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6281
2.

Conference Proceedings
Conference Proceedings
2. Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications [5853-108]
Philipsen, V. ; Leunissen, L. ; De Ruyter, R. ; Jonckheere, R. ; Marlin, P. ; Wakefield, C. ; Johnson, S. ; Cangemi, M. ; Buxbaum, A. ; Morrison, T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.211-222,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853