1.

Conference Proceedings
Conference Proceedings
1. Mask availability for next-generation lithography
Lercel, M.J. ; Fisch, E. ; Racette, K.C. ; Lawliss, M. ; Williams, C. T. ; Kindt, L. ; Huang, C.
Pub. info.: 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.18-22,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4764
2.

Conference Proceedings
Conference Proceedings
2. Reduction of image placement errors in EPL masks (Invited Paper)
II, O.R.W. ; Reu, P.L. ; Engelstad, R.L. ; Lovell, E.G. ; Lercel, M.J. ; Thiel, C.W. ; Lawliss, M.S. ; Mackay, R.S.
Pub. info.: Emerging Lithographic Technologies VII.  1  pp.521-530,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5037
3.

Conference Proceedings
Conference Proceedings
3. Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC
Racette, K.C. ; Williams, C.T. ; Fisch, E. ; Kindt, L. ; Lawliss, M. ; Ackel, R. ; Lercel, M.J.
Pub. info.: Emerging Lithographic Technologies VI.  Part One  pp.161-172,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
4.

Conference Proceedings
Conference Proceedings
4. EUVL mask fabrication for the 45-nm node
Fisch, E. ; Kindt, L. ; Lercel, M.J. ; Racette, K.C. ; Williams, C.T.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.865-871,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
5.

Conference Proceedings
Conference Proceedings
5. Analysis of critical parameters for EPL mask fabrication (Invited Paper)
Lercel, M.J.
Pub. info.: Emerging Lithographic Technologies VI.  Part Two  pp.570-582,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
6.

Conference Proceedings
Conference Proceedings
6. Predicting overlay performance for electron projection lithography masks
Reu, P.L. ; Chen, C.-F. ; Engelstad, R.L. ; Lovell, E.G. ; Lercel, M.J. ; Wood, O.R., II ; Mackay, R.S.
Pub. info.: Emerging Lithographic Technologies VI.  Part Two  pp.547-558,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4688
7.

Conference Proceedings
Conference Proceedings
7. Full-field imaging with a 157-nm scanner
Robinson, C. ; Seong, N. ; Kimmel, K. ; Brunner, T.A. ; Hibbs, M. ; Lercel, M.J. ; McCafferty, D. ; Sewell, H. ; O'Neil, T.K. ; Ivaldi, J. ; Andresen, K.
Pub. info.: Optical Microlithography XVII.  pp.1669-1678,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
8.

Conference Proceedings
Conference Proceedings
8. Effect of reduction ratio on polarization impact for imaging
Gordon, R.L. ; Brunner, T.A. ; Seong, N. ; Lercel, M.J. ; Gallatin, G.M.
Pub. info.: Optical Microlithography XVII.  pp.1499-1509,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
9.

Conference Proceedings
Conference Proceedings
9. EPL mask fabrication
Lercel, M.J. ; Williams, C.T. ; Lawliss, M. ; Ackel, R. ; Kindt, L. ; Fisch, E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.790-798,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754