Fedynyshyn, T. N. ; Doran, S. P. ; Lind, M. L. ; Lyszczarz, T. M. ; DiNatale, W. F. ; Lennon, D. ; Sauer, C. A. ; Muete, J.
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Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.1273-1283, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Kennedy, D. R. ; Cullen, B. ; Lennon, D. ; Webb, G. ; Dennison, P. R. ; Jackson, S. D.
Pub. info.:
Reaction kinetics and the development of catalytic processes : proceedings of the international symposium, Brugge, Belgium, April 19-21, 1999. pp.125-, 1999. Amsterdam. Elsevier
Jackson, S.D. ; Lennon, D. ; Webb, G. ; Willis, J.
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Catalyst deactivation 2001 : proceedings of the 9th International Symposium, Lexington, KY, USA, 7-10 October 2001. pp.271-278, 2001. Amsterdam. Elsevier
Lennon, D. ; Kennedy, D. R. ; Webb, G. ; Jackson, S. D.
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Catalyst deactivation 1999 : proceedings of the 8th International Symposium, Brugge, Belgium, October 10-13, 1999. pp.341-, 1999. Amsterdam, Netherlands. Elsevier
Advances in Resist Technology and Processing XIX. Part Two pp.1126-1137, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering