1.

Conference Proceedings
Conference Proceedings
1. Synthesis of fluorinated materials for 193-nm immersion lithography and 157-nm lithography
Lee, C. H. ; Han, S. ; Park, K. S. ; Kang, H. Y. ; Oh, H. W. ; Lee, J. E. ; Kim, K. M. ; Kim, Y. H. ; Kim, T. S. ; Oh, H.-K.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.564-571,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. An athermal design on LPG-based tunable filter
Lee, J. E. ; Hahn, C. A. ; Nam, S. -H. ; Wang, B. ; Reichard, K. ; Ditto, D. ; Glista, D. ; Wang, Q. ; Yin, S.
Pub. info.: Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications X.  pp.52-63,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5560
3.

Conference Proceedings
Conference Proceedings
3. A review of the recent advances on an all-fiber electronically tunable wavelength filter [6314-26]
Yin, S. ; Reichard, K. M. ; Lee, J. E. ; Chen, Q. ; Ditto, D. H. ; Mazurowski, J. ; Hackert, M. ; Zhang, Q.
Pub. info.: Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications XII.  pp.63140Q-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6314
4.

Conference Proceedings
Conference Proceedings
4. A quantitative analysis of the performance of an all-fiber electronically tunable wavelength filter using a four-layer model [6314-53]
Lee, J. E. ; Chen, Q. ; Yin, S. ; Lin, M. R. ; Zhang, Q. ; Reichard, K. M. ; Ditto, D. H. ; Mazurowski, J. ; Hackert, M.
Pub. info.: Photorefractive Fiber and Crystal Devices: Materials, Optical Properties, and Applications XII.  pp.63141G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6314
5.

Conference Proceedings
Conference Proceedings
5. ArF photoresist parameter optimization for mask error enhancement factor reduction [5853-60]
Lee, C. H. ; Han, S. ; Park, K. S. ; Yoon, S. ; Kang, H. Y. ; Oh, H. W. ; Lee, J. E. ; Kim, Y. H. ; Kim, T. S. ; Oh, H.-K.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.749-756,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
6.

Conference Proceedings
Conference Proceedings
6. Optimization of chromeless phase mask by comparing scattering bars with zebra patterns [6154-82]
Kong, H. Y. ; Lee, J. E. ; Kwak, E.-A ; Kim, E.-J. ; Park, S.-W. ; Kim, S.-H. ; Shin, D. S. ; Jeong, H. ; Oh, H.-K.
Pub. info.: Optical Microlithography XIX.  pp.615429-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
7.

Conference Proceedings
Conference Proceedings
7. Widely electrically tunable long-period fiber gratings with fe.rroelectric relaxor poly(vinylidene f1uoride- trifluoroethylene - chlorofluoroethylene) terpolymer as second cladding [6117-53]
Chen, Q. ; Lin, M. R. ; Wang, Y. ; Zhang, Q. M. ; Lee, J. E. ; Yin, S. ; Reichard, K. E.
Pub. info.: Organic Photonic Materials and Devices VIII.  pp.61170H-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6117