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10 results

Conference Proceedings

1. CD error sensitivity to "sub-killer" defects at k1 near 0.4:II

Nakagawa,K.H. ; Chen,J.F. ; Socha,R.J. ; Dusa,M.V. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Broeke,D.J.van den

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.893-904, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

2. Practical technology path to sub-0.10-ｦﾌm process generations via enhanced optical lithography

Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Nakagawa,K.H. ; Liebchen,A.

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.995-1016, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

3. Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node

Petersen,J.S. ; McCallum,M. ; Kachwala,N. ; Socha,R.J. ; Chen,J.F. ; Laidig,T.L. ; Smith,B.W. ; Gordon,R.L. ; Mack,C.A.

Pub. info.:	Lithography for semiconductor manufacturing : 19-21 May 1999, Edinburgh, Scotland. pp.73-89, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3741

Conference Proceedings

4. Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask:?.Experimental results

Socha,R.J. ; Shi,X. ; Holman,K.C. ; Dusa,M.V. ; Conley,W. ; Petersen,J.S. ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Chu,M.C. ; Su,C. ; Huang,K. ; Chen,C. ; Le,C. ; Pierrat,C. ; Su,B.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.38-54, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

5. Manufacturing an advanced process characterization reticle incorporating halftone biasing

Nakagawa,K.H. ; Broeke,D.Van Den ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F.

Pub. info.:	15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany. pp.129-134, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3665

Conference Proceedings

6. Binary halftone chromeless PSM technology for λ/4 optical lithography

Chen,J.F. ; Petersen,J.S. ; Socha,R.J. ; Laidig,T.L. ; Wampler,K.E. ; Nakagawa,K.H. ; Hughes,G.P. ; MacDonald,S.S. ; Ng,W.

Pub. info.:	Optical Microlithography XIV. 4346 pp.515-533, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

7. Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation:I

Socha,R.J. ; Petersen,J.S. ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F.

Pub. info.:	18th Annual BACUS Symposium on Photomask Technology and Management. pp.617-641, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3546

Conference Proceedings

8. Making high-performance scattering-bar OPC masks with vector-scan,variable-shaped e-beam,and raster-scan laser mask writers

Lu,H.H. ; Hwang,R. ; Lee,V. ; Chen,J.F. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F.

Pub. info.:	18th Annual BACUS Symposium on Photomask Technology and Management. pp.368-382, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3546

Conference Proceedings

9. Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node

Petersen,J.S. ; McCallum,M. ; Kachwala,N. ; Socha,R.J. ; Chen,J.F. ; Laidig,T.L. ; Smith,B.W. ; Gordon,R.L. ; Mack,C.A.

Pub. info.:	18th Annual BACUS Symposium on Photomask Technology and Management. pp.288-303, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3546

10.

Conference Proceedings

10. Size matters:defect detectability in reticle and wafer inspection including advanced aerial image simulation for defect printability

Almog,E. ; Caldwell,R.F. ; Chang,F.-C. ; Chen,J.F. ; Farrar,N.R. ; Karklin,L. ; Laidig,T.L. ; Sabouri,S. ; Shen,W.P. ; Staud,W. ; Wu,C. ; Zelenko,J.

Pub. info.:	18th Annual BACUS Symposium on Photomask Technology and Management. pp.139-144, 1998. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3546

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Author: Laidig,T.L.