1.

Conference Proceedings
Conference Proceedings
1. Metrology challenges for advanced lithography techniques
I. Englard ; P. Vanoppen ; J. Finders ; I. Minnaert-Janssen ; F. Duray ; J. Meessen ; G. Janssen ; O. Adan ; L. Gershtein ; R. Peltinov ; C. Masia ; R. Piech
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
2.

Conference Proceedings
Conference Proceedings
2. MacroCD contact ellipticity measurement for lithography tool qualification
I. Englard ; E. van Setten ; G. Janssen ; P. Vanoppen ; I. Minnaert-Janssen ; F. Duray ; O. Adan ; A. Moran ; L. Gershtein ; R. Peltinov
Pub. info.: Metrology, inspection, and process control for microlithography XXI.  2007.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6518
3.

Conference Proceedings
Conference Proceedings
3. Accurate in-resolution level overlay metrology for multipatterning lithography techniques
I. Englard ; R. Piech ; C. Masia ; N. Hillel ; L. Gershtein
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.69221D-1-69221D-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922