1.

Conference Proceedings
Conference Proceedings
1. The impact of illumination on feature fidelity for CPL mask technology
Kuijten, J. P. ; Verhappen, A. ; Conley, W. ; van de Goor, S. ; Litt, L. ; Wu, W. ; Lucas, K. ; Roman, B. ; Kasprowicz, B. ; Progler, C. ; Socha, R. ; van den Broeke, D. ; Wampler, K. ; Laidig, T. ; Hsu, S.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1557-1561,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Optical issues of thin organic pellicles in 45-nm and 32-nm immersion lithography [6349-20]
Lucas, K. ; Gordon, J. S. ; Conley, W. ; Saied, M. ; Warrick, S. ; Pochkowski, M. ; Smith, M. D. ; West, C. ; Kalk, F. ; Kuijten, J. P.
Pub. info.: Photomask Technology 2006.  pp.63490K-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349