1.

Conference Proceedings
Conference Proceedings
1. Cleaning of SiO2: Differences Between Thermal and Deposited Oxides
Ravkin, M. ; Farber, J. J. ; Malik, I. J. ; Zhang, J. ; Jensen, A. J. ; Larios, J. M. de ; Krusell, W. C.
Pub. info.: Ultraclean semiconductor processing technology and surface chemical cleaning and passivation : Symposum held April 17-19, 1995, San Francisco, California, USA.  pp.115-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 386
2.

Conference Proceedings
Conference Proceedings
2. Chemical Mechanical Cleaning for Post-CMP Applications: Defects and Metals Results
Zhao, E. Y. ; Emami, R. ; Malik, I. ; Mishra, K. ; Krusell, W. C. ; Larios, J. de ; Hymes, D. J.
Pub. info.: Science and technology of semiconductor surface preparation : symposium held April 1-3, 1997, San Francisco, California, U.S.A..  pp.137-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 477